Thin film deposition systems by chemical or physical processes, equipment for nanotechnology processes
Plasma deposition and corrosion systems by CVD, PECVD, Plasma Etching, ICP Etching, ALD, among others
Thin film deposition systems by physical processes such as thermal evaporation, sputtering, electron-beam, pulsed laser deposition, among others
Devices for mass flow control of gases, liquids, vaporizers, automatic pressure controllers
High power sources for plasma generation in industrial processes or research and development
Materials for physical vapor deposition processes, available on targets or other formed
Ion MatFonts and accessories for industrial and research and development applications